Journal of the Korean Institute of Telematics and Electronics A (전자공학회논문지A)
- Volume 30A Issue 12
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- Pages.69-76
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- 1993
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- 1016-135X(pISSN)
The Optimization of the Selective CVD Tungsten Process using Statistical Methodology
통계적 기법을 이용한 선택적 CVD 텅스텐 공정 최적화 연구
Abstract
The statistical methodology using RSM (response surface method) was used too ptimize the deposition conditions of selective CVD tungsten process for improving the deposition rate and the adhesion property. Temperature, flow rate of SiH
Keywords