The Effect of Defect Sites on the Dissociation of NO on PT(111) Surface

  • 부진효 (성균관대학교 이과대학 화학과) ;
  • 강용철 (성균관대학교 이과대학 화학과) ;
  • 송명철 (성균관대학교 이과대학 화학) ;
  • 박종윤 (성균관대학교 이과대학 물리학과) ;
  • 곽현태 (국민대학교 사범대학 화학교육과) ;
  • 이순보 (성균관대학교 이과대학 화학과)
  • Published : 1993.12.01

Abstract

Adorption of nitric oxide on the Pt(III) surface sputtered by Ar-ion has been studied using thermal desorption spectroscopy and Auger electron spectroscopy. Ar-ion sputtering creates a precursor state of ($NO\beta$ stage) adsorbe dat defect sites. The precursor state is characterized by the terminal bent species . At low coverge mos 샐 adsorbed NO dissociates . And as increasing the coverage, the fraction of dissociation remains about 80%.

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