열처리공학회지 (Journal of the Korean Society for Heat Treatment)
- 제5권2호
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- Pages.95-102
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- 1992
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- 1225-1070(pISSN)
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- 2508-4046(eISSN)
플라즈마 화학 증착에서 증착압력에 따른 TiN 박막의 성장거동
The Study on the Behavior of TiN Thin Film Growth According to Deposition Pressure in PECVD Process
- Lee, Z.H. (Department of Metallurgical Engineering, Yonsei University) ;
- Nam, O.H. (Department of Metallurgical Engineering, Yonsei University) ;
- Lee, I.W. (Department of Heat Treatment, Suwon Industrial College) ;
- Kim, M.I. (Department of Metallurgical Engineering, Yonsei University)
- 발행 : 1992.06.30
초록
In this study, we tried to describe the quantitative model of TiN film structure which was deposited by PECVD process. The macro-grain growth behavior was studied at the various deposition pressures and times. As a result, It was confirmed that TiN films had the typical Zone 1 structure, and macro-columnar grains were, without reference to the deposition pressure, grown ballistic type by the growth-death competition following the equation,
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