한국재료학회지 (Korean Journal of Materials Research)
- 제2권1호
- /
- Pages.27-34
- /
- 1992
- /
- 1225-0562(pISSN)
- /
- 2287-7258(eISSN)
Characterization of tantalum silicide films formed by composite sputtering and rapid thermal annealing
- Cho, Hyun-Choon (Electronics & Electrical Eng. Div., KINITI) ;
- Paek, Su-Hyon (Dept. of Materials Eng., Hanyang Univ.) ;
- Choi, Jin-Seok (Dept. of Materials Eng., Hanyang Univ.) ;
- Mah, Jae-Pyung (Dept. of Electronics Eng., Honam Univ.) ;
- Ko, Chul-Gi (HyunDai Electronics Research Center) ;
- Kim, Dong-Won (Dept. of Materials Eng., Kyunggi Univ.)
- 발행 : 1992.02.01
초록
Tantalum silicide films are prepared from a composite
키워드