Korean Journal of Materials Research (한국재료학회지)
- Volume 2 Issue 1
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- Pages.27-34
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- 1992
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- 1225-0562(pISSN)
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- 2287-7258(eISSN)
Characterization of tantalum silicide films formed by composite sputtering and rapid thermal annealing
- Cho, Hyun-Choon (Electronics & Electrical Eng. Div., KINITI) ;
- Paek, Su-Hyon (Dept. of Materials Eng., Hanyang Univ.) ;
- Choi, Jin-Seok (Dept. of Materials Eng., Hanyang Univ.) ;
- Mah, Jae-Pyung (Dept. of Electronics Eng., Honam Univ.) ;
- Ko, Chul-Gi (HyunDai Electronics Research Center) ;
- Kim, Dong-Won (Dept. of Materials Eng., Kyunggi Univ.)
- Published : 1992.02.01
Abstract
Tantalum silicide films are prepared from a composite
Keywords