전자공학회논문지A (Journal of the Korean Institute of Telematics and Electronics A)
- 제29A권9호
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- Pages.29-35
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- 1992
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- 1016-135X(pISSN)
얇은 열산화-질화막의 특성평가
Evaluation of Characteristics of Oxidized Thin LPCVD-$Si_{3}N_{4}$ Film
초록
Dielectric thin film of N/O (Si
키워드