전자공학회논문지A (Journal of the Korean Institute of Telematics and Electronics A)
- 제29A권8호
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- Pages.63-70
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- 1992
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- 1016-135X(pISSN)
Remote PECVD 산화막의 증착특성 및 박막 특성 연구
A Study of Deposition Properties and Characteristics of $SiO_2$ T film Grown by Remote Plasma-Enhanced Chemical Vapor Deposition
초록
Deposition properties and film characteristics of Remote PECVD silicon dioxide were investigated. Using
키워드