대한전기학회논문지 (The Transactions of the Korean Institute of Electrical Engineers)

대한전기학회 (The Korean Institute of Electrical Engineers)
권호 표지

HCD이온플레이팅 방법을 이용한 zzTiC코팅에 관한 연구

A Study on the TiC Coating Using Hollow Cathode Discharge Ion Plating

  • 김인철 (대우전자㈜ 영상연구소) ;
  • 서용운 (서울대 대학원 전기공학과) ;
  • 황기웅 (서울대 공대 전기공학과)
  • 발행 : 1992.08.01

⟨ 이전 논문 다음 논문 ⟩

초록

Titanium carbide(TiC) films, known as having excellent characteristics of resistance to wear and corrosion, were deposited on SUS-304 sheets using HCD(Hollow Cathode Discharge) reactive ion plating with acetylene gas as the reactant gas. The characteristics of TiC films were examined by X-ray diffraction, micro-Vickers hardness tester, ${\alpha}$-step, SEM(Scanning Electron Spectroscopy), ESCA(Electron Spectroscopy for Chemical Analysis), and AES(Auger Electron Spectroscopy) and the results were discussed with regard to the changes of various deposition conditions(bias voltage, acetylene flow rate, temperature).

키워드