전자공학회논문지A (Journal of the Korean Institute of Telematics and Electronics A)
- 제28A권11호
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- Pages.910-914
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- 1991
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- 1016-135X(pISSN)
티타늄 살리사이드 공정을 이용한 트랜지스터의 특성 및 오실레이터 I.C에의 적용(I)
Characteristic of Transistor Using Ti-SALICIDE Process and Its Application to Oscillator I,C(I)
초록
This paper describes the improvement of frequency characteristic of crystal oscillator I.C using Ti-Salicide. The characteristics of transistor(drive current) using Ti-Salicide process are better than Poly-Si process, because the mobility. To know frequency characteristic of oscillator I.C, the simulation is performed using inverter buffer chain of Fan-out 10 TTL. Its result shows at once the generation of normal clock pulse in input signal and the improvement of rising and falling time.
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