Journal of the Korean Institute of Telematics and Electronics A (전자공학회논문지A)
- Volume 28A Issue 10
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- Pages.840-846
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- 1991
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- 1016-135X(pISSN)
Effect of Surface States of the Substrate on the Temperature Rampup Rate During Rapid Thermal Annealing by Halogen Lamps
할로겐 램프에 의한 급속 열처리에서 기판 표면 상태에 따른 온도 상승 효과에 관한 연구
Abstract
In case of the rapid thermal process by halogen lamps, an optical pyrometer is generally used to measure the temperature. It is, however, necessary to measure the temperature by the thermocouple when the process temperature is lower than 700
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