References
- VLSI Technologies Through the 80's and Beyond The Role of Insulators in VLSI Technologies D.J. Mcgreivy;Dennis J. Mcgreivy;Kenneth A. Pickar;Silver Springs
- J. Vac. Soi. Technol. v.14 no.5 Advances in Deposition Processes for Passivation Films Werner Kern;Richard S. Rosler
- J. Electrochem. Soc. v.117 no.4 Chemical Vapor Deposition of Silicate Glasses for Use with Silicon Devices Werner Kern;Richard C. Heim
- RCA Review v.37 no.3 CVD Glass Films for Passivation of Silicon Devices, Preparation, Composition and Stress Properties Werner Kern;G.L. Schnable;A.W. Fisher
- RCA Review Deposition and Properties of Silicon Dioxide and Silicate Films Prepared by Low-Temperature Oxidation of hydrides Werner Kern;A.W. Fisher
- Solid State Technology v.63 Low Pressure CVD Production Processes for Poly, Nitride and Oxide Richard S. Rosler
- J. Appl. Phys. v.44 no.3 Growth of Silica and Phosphosilicate Films B. Jayant Baliga;Sorab K. Ghandhi
- J. Appl. Phys. v.52 no.11 Deposition Kinetics of SiO₂ Film Masahiko Maeda;Hiroaki Nakamura
- Acta. Chem. v.25 Thermodynamic Studies of High Temperature Equilibria G. Erikson
- RCA Review The Deposition of Vitreous Silicon Dioxide Films from Silane N. Goldsmith;W. Kern
- Solid State Technolohy v.123 Improved Atmospheric-Pressure Chemical-Vapor-Deposition System for Depositing Silica and Phosphosilicate Glass Thin Films L.W. Winkle;C.W. Nelson
- J. Electrochem. Soc. v.649 Pyrolytic Deposition of Silicon Dioxide in and Evaquated System J. Oroshnik;J. Kraitchman
- J. Electrochem. Soc. v.121 no.6 The Current Understanding of Charges in the Thermally Oxidized Silicon Structure Bruce E. Deal
- RCA Review v.42 Observations of Electron and Hole Transport Through Thin SiO₂ Films S.T. Hsu