대한전자공학회논문지 (Journal of the Korean Institute of Telematics and Electronics)
- 제25권11호
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- Pages.1329-1334
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- 1988
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- 1016-135X(pISSN)
적외선 CVD 방법을 이용한 산화막 성장에 $NH_3$ 가 미치는 영향
Effects of NH3 on the Growth of Oxide Film by Infrared-CVD Method
- Lee, Chul-Seung (Dept. of Elec. Eng., Kyunghee Univ.) ;
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Chung, Kwan-Soo
(Dept. of Elec. Eng., Kyunghee Univ.) ;
- Kim, Chul-Ju (Dept. of Elec. Eng., Seoul City Univ.)
- 발행 : 1988.11.01
초록
A new method was developed for growing oxidation film by thermal reaction of
키워드