Journal of the Korean Institute of Telematics and Electronics (대한전자공학회논문지)
- Volume 25 Issue 5
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- Pages.501-508
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- 1988
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- 1016-135X(pISSN)
Light-Induced Degradation of Hydrogenated Amorphous Silicon
광조사에 따른 비정질 실리콘의 열화
Abstract
This paper presents the light-induced effects on the elelctrical and optical properties of undoped and doped hydrogenated amorphous silicon films. The changes in the conductivities and the activation energies of various types of a-Si:H films due to the prolonged exposure to light have been characterized as a function of deposition conditions and illumination periods. The dark conductivity changes may be quenched for heavier doped a-Si:H films. We have also analyzed the variations of micro-structure of a-Si:H film such as silicon-hydrogen bondings in the rocking and stretching modes utilizing infrared spectroscopy. From the experimental results, it is elucidated that doping effects must be crucial to the degradations of the fundamental properties of a-Si:H due to light-induced effects.
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