Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 21 Issue 3
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- Pages.114-129
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- 1988
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
Physical Vapour Deposition Fundamentals and Technical Aspects
Abstract
The principles of the physical vapour deposition processes(PVC); evaporation, sputting, and ion plating are presented and compared with each other with respect to coating properties, deposition rate and process control. The significance of coating sources and vacuum equipment for hard materials coating is discussed.
Keywords