Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 20 Issue 3
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- Pages.106-117
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- 1987
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
Effects of Chemical Vapor Deposition Parameters on The Hardness and the Structural Characteristics of TiN Film
TiN피막의 경도 및 구조적 특성에 미치는 화학증착 조건의 영향
- Shin, Jong-Hoon (Dept. of Metall. Eng. KOREA University) ;
- Lee, Seong-Rae (Dept. of Metall. Eng. KOREA University) ;
- Baek, Young-Hyun (Dept. of Metall. Eng. KOREA University)
- Published : 1987.09.01
Abstract
The microhardness and the structural characteristics of the chemically vapor deposited TiN film on the 430 stainless steel substrate have been investigated with various deposition parameters such as the deposition time, the total flow rate, the flow rate ratio
Keywords