무전해침전법에 의한 투명전도박막 제작에 관한 연구

Electroless Deposition of ITO Thin Films

  • ;
  • 邊潤植 (仁荷大學校 電子工學科) ;
  • 李建基
  • 발행 : 1987.02.01

초록

ITO thin film was prepared by the electroless deposition technique. ITO thin film had a high transmittance in the visible region and a high reflectance in the near infrared region. The energy gap of the thn film (Sn/Im=0.1) was 4.05 eV, the carrier concentration was 2x10**21 cm**-3, and the electric resistivity was 1.5x10**-3 ohm-cm. We confirmed that ITO thin film was a degenerated n-type semiconductor.

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