참고문헌
- J. Chem. Soc. T. V. Arden;G. A. Wood
- J. Chem. Soc. T. V. Arden;Marion Rowly
- J. Chem. Soc. (A) W. P. Griffith;P. J. B. Lesniak
- J. Phys. Chem. v.60 C. F. Baes, Jr.
- Russ. J. Inorg. Chem. v.19 A. A. Lvakin(et al.)
- J. Inorg Nucl. Chem. v.35 C. Heitner-Wirguin;M. Gantz
- J. Inorg. Nucl. Chem. v.35 F. Preuss;J. Woitschich(et al.)
- J. Chem. Phys. v.21 Liewellyn H. Jones;Robert A. Penneman
- J. Chem. Soc., (A) W. P. Griffith;T. D. Wickin
- J. Chem. Soc., (A) W. P. Griffith
- J. Amer. Chem. Soc. v.35 Leo D. Frederickson(et al.)
- J. Chem. Soc. W. P. Griffith;T. D. Wickins
- J. Chem. Soc. W. P. Griffith;T. D. Wickins
- J. Amer. Chem. Soc. v.93 W. Robert Scheidt(et al.)
- J. Amer. Chem. Soc. v.93 W. Robert Scheidt(et al.)
- J. Inorg. Nucl. Chem. v.15 J. Magee;E. Richardson
- J. Inorg. Nucl. Chem. v.27 R. C. Paul;A. Kumar
- J. Chem. Soc. O. W. Howarth;R. E. Richards
- J. Chem. Soc. L. F. Larkworthy(et al.)
- Can. J. Chem. v.43 J. V. Hatton(et al.)
- Acta. Chem. Scand. v.10 F. J. C. Rossotti;Hazel Rossotti
- Acta. Chem. Scand. v.8 Sten Ahrland;Ragnar Larsson
- J.C.S. Dalton Ronald N. Sylva;Malcolm R. Davidson
- J. Inorg. Nucl. Chem. v.36 Florin T. Bunus
- J. Inorg. Nucl. Chem. v.18 D. Banerjea;K. K. Tripathi
- J. Korean Chem. Soc. v.28 K. W. Cha;J. S. Choi
- J. Inorg. Nucl. Chem. v.36 Nobutoshi Kiba;Tsugio Takeuchi
- J. Chem. Soc. J. Sutton
- Rev. Roun. Chem. v.18 Mavrodin T. Maria
- Russ. J. Inorg. Chem. v.20 M. G. Kuzina;A. A. Lipovskii
- J. Korean Chem. Soc. v.28 K. W. Cha;J. H. Kim
- J. Amer. Chem. Soc. v.79 C. Li. Norman(et al.)
- Chem. Revs. v.61 Kotra V. Krishnamurthy(et al.)
- Chem. Revs. v.61 Kotra V. Krishnamurthy(et al.)
- C. A. v.52 Kotra V. Krishnamurthy(et al.)
- Acta. Chem. Scand. v.5 S. Ahrland
- ModernMethods for the Separation of Rarer Metal Ions J. Korkish
- Bull. Chem. Soc. Jap. v.37 D. N. Sathyanarayana;C. C. Patel
- J. Inorg. Nucl. Chem. v.27 R. C. Paul;A, Kumar
- J. Inorg. Nucl. Chem. v.6 Robert I. Walter
- J. Inorg. Nucl. Chem. v.3 D. P. Graddon
- Bull. Inst. Basic. Sci. Inha Univ. v.6 K. W. Cha;J. H. Kim