Microstructure Study on $Si_3N_4$ Formed by Various Nitridation Condition

질화규소의 반응조건에 따른 미세구조 변화

  • 전계남 (한국과학기술원 재료공학과) ;
  • 김종희 (한국과학기술원 재료공학과)
  • Published : 1984.03.01

Abstract

This paper deals with the reaction-bonded silicon nitride I terms of its microstructural development during nitrida-tion. Silicon powder compacts were reacted with nitrogen at 1185$^{\circ}C$ and 13$65^{\circ}C$ according to the nitriding schedule. Microstructures of nitrided specimens were examined by means of optical and scanning electron microscope to discuss the nitridation or microstructural development at initial and intermediat stage of nitridation. Reaction products were also analysed by X-ray diffraction method at each stage of nitridation. The results indicate that ho-mogeneous and uniform microstructure with find porosity can be obtained only under the reaction condition. such as slow and relatively constant reaction rate with time.

Keywords

References

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