THE STUDY ON THE CEPHALOMETRIC SIMILARITY BETWEEN PARENTS AND OFFSPRING

친자간의 두부 X선 규격사진상에 있어서의 유사성에 관한 연구

The study was performed to investigate cephalomeric similarity between parents and offspring of the Korean family by lateral cephalometric analysis. The lateral cephalograms consist of the 8 families comprising 16 parents, 5 sons and 7 daughters. In order to make an investigation of the similarity, set up, and 22 linear measurements on each depth measurements were made. The author drew up the profilograms to compare parents with offspring in each family group. The obtained results were as follows: 12 measuring points were and height and 5 angular 1. There was no common similarity on specific region between parents and offspring on each family group. 2. There was partial similarity between single parent and offspring. 3. The partial similarity between single parent and offspring was noted on the upper face in general.