DC 스퍼터법과 유도결합형 플라즈마 스퍼터법으로 증착된 HfN 코팅막의 물성 비교연구

A Comparative Study of Nanocrystalline HfN Coatings Fabricated by Direct Current and Inductively Coupled Plasma Assisted Magnetron Sputtering

Nanocrystalline HfN coatings were prepared by reactively sputtering Hf metal target with N2 gas using a magnetron sputtering system operated in DC and ICP (inductively coupled plasma) condition with various powers. The effects of ICP power, ranging from 0 to 200 W, on the coating microstructure, corrosion and mechanical properties were systematically investigated with FE-SEM, AFM, potentiostat and nanoindentation. The results show that ICP power has a significant influence on coating microstructure and mechanical properties of HfN coatings. With the increasing of ICP power, coating microstructure evolves from the columnar structure of DC process to a highly dense one. Average grain size and nano hardness of HfN coatings were also investigated with increasing ICP powers.