Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2016.02a
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- Pages.183-183
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- 2016
Research on parallelization mechanism of inductively coupled plasma for large area plasma source
- Lee, Jang-Jae ;
- Kim, Si-Jun ;
- Kim, Gwang-Gi ;
- Lee, Ba-Da ;
- Lee, Yeong-Seok ;
- Yeom, Hui-Jung ;
- Kim, Dae-Ung ;
- Yu, Sin-Jae
- 이장재 (충남대학교 물리학과) ;
- 김시준 (충남대학교 물리학과) ;
- 김광기 (충남대학교 물리학과) ;
- 이바다 (충남대학교 물리학과) ;
- 이영석 (충남대학교 물리학과) ;
- 염희중 (충남대학교 물리학과) ;
- 김대웅 (한국과학기술원 기계공학부) ;
- 유신재 (충남대학교 물리학과)
- Published : 2016.02.17
Abstract
Inductively coupled plasma having the high-density is often used for high productivity in the plasma processing. In large area processing, the plasma can be generated by using the multi-pole connected in parallel. However, in case of this, the power cannot transfer to plasma uniformly. To address the problem, we studied the mechanism of inductively coupled plasma connected in parallel by using transformer model. We also studied about the change of the plasma parameters over the time through the power balance equation and particle balance equation.