Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2016.02a
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- Pages.147.1-147.1
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- 2016
Stability of hydrophobic properties of plasma polymerized tetrakis(trimethylsilyloxy)silane film surface
- Jang, Jinsub (Department of Physics, Sungkyunkwan University) ;
- Woo, Sungmin (Department of Physics, Sungkyunkwan University) ;
- Ban, Wonjin (Department of Physics, Sungkyunkwan University) ;
- Nam, Jaehyun (Department of Physics, Sungkyunkwan University) ;
- Lee, Yeji (Department of Physics, Sungkyunkwan University) ;
- Choi, Woo Seok (Department of Physics, Sungkyunkwan University) ;
- Jung, Donggeun (Department of Physics, Sungkyunkwan University)
- Published : 2016.02.17
Abstract
Hydrophobic thin films are variously applicable for encapsulation of organic devices and water repulsive glass, etc. In this work, the stability of hydrophobic characteristics of plasma polymerized tetrakis (trimethylsilyloxy) silane (ppTTMSS) thin films were investigated. The films were deposited with plasma enhanced chemical vapor deposition (PECVD) on the glass. The deposition plasma power and deposition pressure was 70 W and 600 mTorr, respectively. Thereafter, deposited films were treated by 248nm KrF excimer laser. Stability of hydrophobic properties of plasma polymerized tetrakis(trimethylsilyloxy)silane film surface was tested by excimer laser irradiation, which is thought to simulate severe outdoor conditions. Excimer laser irradiation cycles changed from 10 to 200 cycles. The chemical structure and hydrophobicity of ppTTMSS films were analyzed by using Fourier transform infrared (FTIR) spectroscopy and water contact angle (WCA) measurement, respectively. Absorption spectra peaks and WCA of excimer laser treated ppTTMSS films did not change notably. These results show that our ppTTMSS films possess stable hydrophobic properties.
Keywords
- tetrakis(trimethylsilyloxy)silane;
- Plasma enhanced chemical vapor deposition;
- Excimer laser;
- Fourier transform infrared spectroscopy;
- Water contact angle