Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2014.02a
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- Pages.430.1-430.1
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- 2014
Control of Nanospacing in TiO2 Nanowire Array Using Electron Beam Lithography
- Yun, Young-Shik (School of Integrated Technology, Yonsei University) ;
- Yeo, Jong-Souk (School of Integrated Technology, Yonsei University)
- Published : 2014.02.10
Abstract
According to advanced nanotechnology in the field of biomedical engineering, many studies of the interaction between topography of surfaces and cellular responses have been focused on nanostructure. In order to investigate this interaction, it is essential to make well-controlled nanostructures. Electron beam lithography (EBL) have been considered the most typical processes to fabricate and control nano-scale patterns. In this work,