Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2014.02a
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- Pages.283.2-283.2
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- 2014
Correlation between Charged Silicon Nanoparticles in the Gas Phase and the Low Temperature Deposition of Crystalline Silicon Films during Hot Wire Chemical Vapor Deposition
- Yu, Seung-Wan (Vacuum Center, Korea Research Institute of Standards and Science) ;
- Hong, Ju-Seop (KCC Research & Development Center) ;
- Kim, Jeong-Hyeong (Vacuum Center, Korea Research Institute of Standards and Science) ;
- Yu, Sin-Jae (Vacuum Center, Korea Research Institute of Standards and Science) ;
- Hwang, Nong-Mun (Department of Materials Science and Engineering, Seoul National University)
- Published : 2014.02.10
Abstract
열필라멘트 화학증착공정(Hot Wire Chemical Vapor Deposition)에서 기상 에서 생성되는 하전된 실리콘 나노입자와 저온결정성 실리콘박막 증착의 연관성을 압력의 변화에 따른 상호비교를 통해 조사하였다. 필라멘트 온도는