한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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- Pages.166.2-166.2
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- 2014
Surface Chemical Reactions for Metal Organic Semiconductor Films by Alternative Atomic Layer Deposition and Thermal Evaporation
- Kim, Seong Jun (Thin Film Materials Laboratory, Korea Research Institute of Chemical Technology) ;
- Min, Pok Ki (Thin Film Materials Laboratory, Korea Research Institute of Chemical Technology) ;
- Lim, Jong Sun (Thin Film Materials Laboratory, Korea Research Institute of Chemical Technology) ;
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Kong, Ki-Jeong
(Thin Film Materials Laboratory, Korea Research Institute of Chemical Technology) ;
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An, Ki-Seok
(Thin Film Materials Laboratory, Korea Research Institute of Chemical Technology)
- 발행 : 2014.02.10
초록
In this work, we demonstrated a facile and effective method for deposition of metal tetraphenylporphyrin (MTPP) thin film by a combined a thermal evaporation (TE) and atomic layer deposition (ALD). For the deposition of Zn-TPP thin film, Tetraphenylporphyrin (TPP) and diethyl zinc (DEZ) were used as organic and inorganic materials, respectively. Optimum conditions for the deposition of Zn-TPP thin film were established systematically: (1) the exposure time of DEZ as inorganic precursor and (2) the substrate temperature were adjusted, respectively. As a result, we verified that the surface reaction between organic semiconductor (TPP) and metal atom (Zn) was ALD process. In addition, we calculated activation energy by using Arrhenius equation for the substrate temperature versus area change rate of pyrrolic nitrogen. The surface and interface reactions between TPP with Zn were investigated by X-ray photoelectron spectroscopy, Raman spectroscopy, UV-vis spectroscopy, and scanning electron microscopy. These results show a facile and well-controllable fabrication technique for the metal-organic thin film for future electronic applications.