한국표면공학회:학술대회논문집 (Proceedings of the Korean Institute of Surface Engineering Conference)
- 한국표면공학회 2013년도 춘계학술대회 논문집
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- Pages.154-154
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- 2013
The effect of negative bias stress stability in high mobility In-Ga-O TFTs
- Jo, Kwang-Min (School of Material Science and Engineering, KyungPook National University) ;
- Sung, Sang-Yun (School of Material Science and Engineering, KyungPook National University) ;
- You, Jae-Lok (School of Material Science and Engineering, KyungPook National University) ;
- Kim, Se-Yun (School of Material Science and Engineering, KyungPook National University) ;
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Lee, Joon-Hyung
(School of Material Science and Engineering, KyungPook National University) ;
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Kim, Jeong-Joo
(School of Material Science and Engineering, KyungPook National University) ;
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Heo, Young-Woo
(School of Material Science and Engineering, KyungPook National University)
- 발행 : 2013.05.30
초록
In this work, we investigated the characteristics and the effects of light on the negative gate bias stress stability (NBS) in high mobility polycrystalline IGO TFTs. IGO TFT showed a high drain current on/off ratio of
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