Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2013.08a
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- Pages.251.1-251.1
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- 2013
Oxidative Etching of Imprinted Nanopatterns by Combination of Vacuum Annealing and Plasma Treatment
- Park, Dae Keun (Department of Chemistry, Sungkyunkwan University) ;
- Kang, Aeyeon (Department of Chemistry, Sungkyunkwan University) ;
- Jeong, Mira (Korea Institute of Machinery and Materials (KIMM)) ;
- Lee, Jae-Jong (Korea Institute of Machinery and Materials (KIMM)) ;
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Yun, Wan Soo
(Department of Chemistry, Sungkyunkwan University)
- Published : 2013.08.21
Abstract
Combination of oxidative vacuum annealing and oxygen plasma treatment can serve as a simple and efficient method of line-width modification of imprinted nanopatterns. Since the vacuum annealing and oxygen plasma could lead mass loss of polymeric materials, either one of the process can yield a narrowed patterns. However, the vacuum annealing process usually demands quite high temperatures (