Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)

The Korean Vacuum Society (한국진공학회)
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Study on Improvement of Diamond Deposition on Al2O3 Ceramic Substrates by a DC Arc Plasmatron

  • Kang, In-Je (Department of Nuclear & Energy Engineering, Jeju National University) ;
  • Joa, Sang-Beom (Department of Nuclear & Energy Engineering, Jeju National University) ;
  • Chun, Se-Min (Department of Nuclear & Energy Engineering, Jeju National University) ;
  • Lee, Heon-Ju (Department of Nuclear & Energy Engineering, Jeju National University)
  • Published : 2012.02.08
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Abstract

We presented plasma processing using a DC Arc Plasmatron for diamond deposition on Al2O3 ceramic substrates. Plasma surface treatments were conducted to improve deposition condition before processing for diamond deposition. The Al2O3 ceramic substrates deposited, $5{\times}15mm^2$, were investigated by Scanning Electron Microscopy (SEM), Fourier Transform Infrared Spectroscopy (FTIR) and X-ray Diffraction (XRD). Properties of diamond (111), (220) and (311) peaks were shown in XRD. We identified nanocrystalline diamond films on substrates. The results showed that deposition rate was approximately $2.2{\mu}m/h$ after plasma surface treatments. Comparing the above result with a common processing, deposition rate was improved. Also, the surface condition was improved more than a common processing for diamond deposition on Al2O3 ceramic substrates.

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