Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 2011.10a
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- Pages.28.1-28.1
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- 2011
Amorphous Carbon Films on Ni using with $CBr_4$ by Thermal Atomic Layer Deposition
Abstract
We deposited the carbon films on Ni substrates by thermal atomic layer deposition (th-ALD), for the first time, using carbon tetrabromide (