Crystalline Silicon Solar Cell with Selective Emitter Using One-step Diffusion Process

One-step diffusion으로 형성된 선택적 에미터 결정질 실리콘 태양전지에 관한 연구

  • Jeong, Kyeong-Taek (School of Semiconductor and Chemical Engineering, Chonbuk National University) ;
  • Yang, O-Bong (School of Semiconductor and Chemical Engineering, Chonbuk National University) ;
  • Yu, Gwon-Jong (Photovoltaic Research Center, Korea Institute of Energy Research) ;
  • Lee, Jeong-Chul (Photovoltaic Research Center, Korea Institute of Energy Research) ;
  • Song, Hee-Eun (Photovoltaic Research Center, Korea Institute of Energy Research)
  • 정경택 (전북대학교 반도체.화학공학부) ;
  • 양오봉 (전북대학교 반도체.화학공학부) ;
  • 유권종 (한국에너지기술연구원) ;
  • 이정철 (한국에너지기술연구원) ;
  • 송희은 (한국에너지기술연구원)
  • Published : 2011.11.24

Abstract

Recent studies in crystalline silicon solar cell fabrication have been focused on high efficiency and low cost. However, the rising of the cost results in additional processes to approach high efficiency. The fabrication process also becomes complicated with additional technologies. In this paper, we studied the selective emitter formation with phosphorous paste to improve the conversion efficiency. Selective emitter formations like two-step diffusion or etch-back method require at least one more step compared in the conventional line since heavily and lightly doped area was needed to form separately.However,one-step diffusion process is the method diffusing heavily and lightly doped area at the same time only with additional screen-printing step. This study lays the foundation for the simple way to form the selective emitter.

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