한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2010년도 제39회 하계학술대회 초록집
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- Pages.277-277
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- 2010
Synthesis of Graphene by Plasma Enhanced Chemical Vapor Deposition and Its transfer for Device Application
- 발행 : 2010.08.18
초록
In this report, we present a very effective growing method of graphene using plasma enhanced chemical vapor deposition(PECVD). The graphene is successfully grown on copper substrate. Low temperature growing is obtained with methane and hydrogen plasma. The graphene layers are analyzed by Raman spectroscopy and atomic force microscope. We also provide a transfer technique of graphene layer onto silicon substrate to build up various kinds of application devices.
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