Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)

The Korean Vacuum Society (한국진공학회)
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Transparent Thin Film Transistor using $Al_2O_3$/$HfO_2$ as Gate Insulator Layer

  • Park, J.K. (School of Information and Communication engineering, Sungkyunkwan University) ;
  • Roh, Yong-Han (School of Information and Communication engineering, Sungkyunkwan University)
  • Published : 2009.02.11
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