Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2009.02a
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- Pages.262.2-262.2
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- 2009
The Plasma Characterization of Multiple RF Power for Oxide Via Etching Process
- Park, Kun-Joo (DMS Co., Ltd) ;
- Kim, Min-Shik (DMS Co., Ltd) ;
- Lee, Kwang-Min (DMS Co., Ltd) ;
- Chae, Hee-Yeop (Dept. of Chemical Eng.,SungKyunKwan Univ.) ;
- Lee, Hi-Deok (Dept.of Electronics Eng., Chungnam National Univ.)
- Published : 2009.02.11
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