Maskless Chemical Dry Texturing of Silicon Surface using Fluorine Radicals and NO Gas

  • Ahn, J.H. (School of Advanced Materials Science& Engineering, SungKyunKwan University) ;
  • Park, Y.R. (School of Advanced Materials Science& Engineering, SungKyunKwan University) ;
  • Kim, J.S. (School of Advanced Materials Science& Engineering, SungKyunKwan University) ;
  • Lee, N.E. (School of Advanced Materials Science& Engineering, SungKyunKwan University)
  • Published : 2009.02.11