TONOS (TiN-Oxide-Nitride-Oxide-Si) Flash Memory with ONO and NON Tunneling Barriers

  • Jung, Myung-Ho (Department of Electronic Materials Engineering, Kwangwoon University) ;
  • Kim, Kwan-Su (Department of Electronic Materials Engineering, Kwangwoon University) ;
  • Park, Goon-Ho (Department of Electronic Materials Engineering, Kwangwoon University) ;
  • Oh, Se-Man (Department of Electronic Materials Engineering, Kwangwoon University) ;
  • Chung, Hong-Bay (Department of Electronic Materials Engineering, Kwangwoon University) ;
  • Lee, Young-Hie (Department of Electronic Materials Engineering, Kwangwoon University) ;
  • Jung, Jong-Wan (Department of Nano Science and Technology, Sejong University) ;
  • Cho, Won-Ju (Department of Electronic Materials Engineering, Kwangwoon University)
  • Published : 2009.02.11