Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2009.04b
- /
- Pages.65-65
- /
- 2009
Etching characteristics of $Ba_2Ti_9O_{20}$ films in inductively coupled $Cl_2$ /Ar plasma
$Cl_2$ /Ar 혼합가스를 이용한 $Ba_2Ti_9O_{20}$ 유전박막의 유도결합 플라즈마 식각
- Lee, Tae-Hoon (Korea Univ.) ;
- Kim, Man-Su (Korea Univ.) ;
- Jun, Hyo-Min (Korea Univ.) ;
- Kwon, Kwang-Ho (Korea Univ.)
- Published : 2009.04.03
Abstract
본 연구에서는 ICP 식각장치 및