Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2009.06a
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- Pages.327-327
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- 2009
Defect-related yellowish emission of un doped ZnO/p-GaN:Mg heterojunction light emitting diode
- Han, W.S. (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
- Kim, Y.Y. (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
- Ahn, C.H. (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
- Cho, H.K. (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
- Kim, H.S. (Department of Nano Semiconductor Engineering, Korea Maritime University) ;
- Lee, J.H. (Department of Nano Semiconductor Engineering, Korea Maritime University)
- Published : 2009.06.18
Abstract
ZnO with a large band gap (~3.37 eV) and exciton binding energy (~60 meV), is suitable for optoelectronic applications such as ultraviolet (UV) light emitting diodes (LEDs) and detectors. However, the ZnO-based p-n homojunction is not readily available because it is difficult to fabricate reproducible p-type ZnO with high hall concentration and mobility. In order to solve this problem, there have been numerous attempts to develop p-n heterojunction LEDs with ZnO as the n-type layer. The n-ZnO/p-GaN heterostructure is a good candidate for ZnO-based heterojunction LEDs because of their similar physical properties and the reproducible availability of p-type GaN. Especially, the reduced lattice mismatch (~1.8 %) and similar crystal structure result in the advantage of acquiring high performance LED devices. In particular, a number of ZnO films show UV band-edge emission with visible deep-level emission, which is originated from point defects such as oxygen vacancy, oxygen interstitial, zinc interstitial[1]. Thus, defect-related peak positions can be controlled by variation of growth or annealing conditions. In this work, the undoped ZnO film was grown on the p-GaN:Mg film using RF magnetron sputtering method. The undoped ZnO/p-GaN:Mg heterojunctions were annealed in a horizontal tube furnace. The annealing process was performed at