Acknowledgement
Supported by : 지식경제부, 정보통신산업진흥원
Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2009.11a
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- Pages.143-143
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- 2009
압력변화에 따른 MgO 박막의 구조적 특성
- Published : 2009.11.12
Abstract
In this paper, MgO thin films were deposited on Si(100) single crystal substrates by RF magnetron sputtering. The effects of RF power, chamber atmosphere, and substrate temperature on the characteristics of MgO thin films were already studied. Thus, we focused on the working pressure. The structural properties of the films changed dramatically with deposition conditions. Structural analyses carried out by X-ray diffraction (XRD). MgO films were obtained at the deposition conditions as follows: