물리적, 화학적 방법으로 환원된 그라핀의 분자구조

  • Ju, Hye-Mi (Korea Institute of Ceramic Engineering and Technology, Yonsei University, Advanced Materials Engineering) ;
  • Choi, Seong-Ho (Korea Institute of Ceramic Engineering and Technology, Yonsei University, Advanced Materials Engineering) ;
  • Cho, Kwang-Yeon (Korea Institute of Ceramic Engineering and Technology, Yonsei University, Advanced Materials Engineering) ;
  • Kim, Chang-Yeoul (Korea Institute of Ceramic Engineering and Technology, Yonsei University, Advanced Materials Engineering) ;
  • Hyun, Sang-Il (Korea Institute of Ceramic Engineering and Technology, Yonsei University, Advanced Materials Engineering) ;
  • Huh, Seung-Hun (Korea Institute of Ceramic Engineering and Technology, Yonsei University, Advanced Materials Engineering) ;
  • Lee, Hong-Lim (Korea Institute of Ceramic Engineering and Technology, Yonsei University, Advanced Materials Engineering)
  • Published : 2009.11.05

Abstract

본 연구에서는 Graphene oxide를 $800^{\circ}C$, 질소분위기 하에서 환원시켜 얻은 $GP_{TR}$과 Hydrazine을 이용한 화학적 처리로 얻은 $GP_{CR}$의 분자구조를 제안하였다. 이때 grapheneoxide는 modified Hummers' method를이용하여 제조하였다. $GP_{TR}$$GP_{CR}$은 모두 표면에 몇몇의 oxide group이 존재하는데$GP_{TR}$은 six layer로 $C_{100}O_{3{\pm}1}$ 의 조성을 갖고 $GP_{CR}$은 three layer로 and $C_{100}O_{6.5{\pm}2}$의 조성을 갖는다. 그리고 면간간격은 $GP_{TR}$$3.432\;{\AA}$, $GP_{CR}$$3.760\;{\AA}$으로 전형적인 방법인 top downprocess로 얻은 graphene 보다 다소 크다는 것을 알 수 있다.

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