Fabrication of ZnO TFTs by micro-contact printing of silver ink electrodes

  • Shin, Hong-Sik (Dept. of Electronics Engineering, Chungnam Nat'l University) ;
  • Yun, Ho-Jin (Dept. of Electronics Engineering, Chungnam Nat'l University) ;
  • Nam, Dong-Ho (Dept. of Electronics Engineering, Chungnam Nat'l University) ;
  • Choi, Kwang-Il (Dept. of Electronics Engineering, Chungnam Nat'l University) ;
  • Baek, Kyu-Ha (Electronic and Telecommunications Research Institute (ETRI)) ;
  • Park, Kun-Sik (Dept. of Electronics Engineering, Chungnam Nat'l University) ;
  • Do, Lee-Mi (Electronic and Telecommunications Research Institute (ETRI)) ;
  • Lee, Hi-Deok (Dept. of Electronics Engineering, Chungnam Nat'l University) ;
  • Wang, Jin-Suk (Dept. of Electronics Engineering, Chungnam Nat'l University) ;
  • Lee, Ga-Won (Dept. of Electronics Engineering, Chungnam Nat'l University)
  • Published : 2009.10.12

Abstract

In this work, we have fabricated inverted staggered ZnO TFTs with 1-${\mu}m$ resolution channel length by micro contact printing (${\mu}$-CP) method. Patterning of micro scale source/drain electrodes without etching is successfully achieved by micro contact printing method by using silver ink and polydimethylsiloxane (PDMS) stamp. And the time dependent characteristics of the sheet resistance show that Ag inklayer could be used as source and drain electrodes for ZnO TFTs.

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