CPD 방식을 통한 PDMS lens의 제작

A clindrical post dipping method to fabricate PDMS microlens array

  • 이경건 (서울대학교 전기 컴퓨터 공학부) ;
  • 장윤호 (서울대학교 전기 컴퓨터 공학부) ;
  • 유병욱 (서울대학교 전기 컴퓨터 공학부) ;
  • 진주영 (서울대학교 전기 컴퓨터 공학부) ;
  • 하준근 (서울대학교 전기 컴퓨터 공학부) ;
  • 박재형 (이화여자대학교 물리과) ;
  • 김용권 (서울대학교 전기 컴퓨터 공학부)
  • Lee, Kyoung-Gun (School of Electrical Engineering and Computer Science, Seoul National University) ;
  • Jang, Yun-Ho (School of Electrical Engineering and Computer Science, Seoul National University) ;
  • Yoo, Byung-Wook (School of Electrical Engineering and Computer Science, Seoul National University) ;
  • Jin, Joo-Young (School of Electrical Engineering and Computer Science, Seoul National University) ;
  • Ha, Joon-Geun (School of Electrical Engineering and Computer Science, Seoul National University) ;
  • Park, Jae-Hyoung (Department of Physics, Ewha Womans University) ;
  • Kim, Yong-Kweon (School of Electrical Engineering and Computer Science, Seoul National University)
  • 발행 : 2009.07.14

초록

A cylindrical post dipping (CPD) method to fabricate the PDMS microlens arrays is presented in this paper. The proposed CPD method is based on the surface tension effect. 2 mm gap and gapless lenses with 2 mm diameter are fabricated and characterized geometically. Both profiles of the fabricated microlens are well-fitted with ideal lens profile. The surface roughness average of the fabricated lens is measured to be 1.953 nm. The focal length of 2mm gap lenses and the gapless lenses is calculated to be 17.00 mm with 0.65 mm standard deviation and 29.88 mm with 2.58 mm standard deviation, respectively. The proposed CPD method can be applied to wafer level lens fabrication due to its simplicity and versatility.

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