Self-Inspection for Photomask Defect Extraction

자체 검사를 이용한 포토마스크 결점 추출

This paper describes the process of extracting defect from optical photomask images. We introduce a new method of finding photomask detects with a single optical photomask damaged image. The proposed algorithm is efficient when an original undamaged image is unavailable. The experiment showed that even a small and discontinuous photomask defect was extracted as well as continuous type of defects.