Proceedings of the Korean Institute of Surface Engineering Conference (한국표면공학회:학술대회논문집)
- 2008.11a
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- Pages.74-76
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- 2008
The Etch rate Effect of Additive Gas In $ZrO_2$ Thin Film Using $Cl_2$ /Ar Plasma
$Cl_2$ /Ar 플라즈마에서 $ZrO_2$ 박막에 첨가된 가스의 식각속도 효과
- Published : 2008.11.19
Abstract
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