Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2008.08a
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- Pages.285-285
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- 2008
Inductively coupled plasma etching of chemical vapor deposition amorphous carbon in $O_2/N_2$ /Ar chemistries
- Lee, H.J. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Park, Y.R. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Kim, J.S. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Ahn, J.H. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Kwon, B.S. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Kim, H.W. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Kim, S.I. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Lee, N.E. (School of Advanced Materials Science & Engineering, Center for Advanced Plasma Surface Technology, Sungkyunkwan University)
- Published : 2008.08.20
Abstract
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