나노임프린트 리소그래피 기술의 연구 및 응용 동향

Trend of recent research and applications on Nanoimprint Lithography

  • 나도백 (한국과학기술정보연구원 정보분석센터) ;
  • 박장선 (한국과학기술정보연구원 ReSEAT 프로그램)
  • 발행 : 2008.10.09

초록

With intensive research and development to mass particular nanostructure of 10nm, Nanoimprint lithography will soon be put to practical use. This paper reviews latest research and application trend and also covers technical articles about Nanoimprint lithography technology Published since 1998, including statistical analysis of collected data(Web of Science DB) and related technical trend.

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