한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2008년도 제34회 동계학술대회 초록집
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- Pages.304-304
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- 2008
Structural and electronic properties of low dielectric constant SiOC(-H) films deposited by using PECVD from DMDMS/O$_2$ precursors
- Kim, Chang-Young (Nano thin Film Materials Laboratory, Department of Physics, Cheju National University) ;
- Jung, An-Soo (Nano thin Film Materials Laboratory, Department of Physics, Cheju National University) ;
- Navamathavan, R. (Nano thin Film Materials Laboratory, Department of Physics, Cheju National University) ;
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Choi, Chi-Kyu
(Nano thin Film Materials Laboratory, Department of Physics, Cheju National University)
- 발행 : 2008.02.14