Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2008.02a
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- Pages.177-177
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- 2008
Comparison of etching characteristics of ArF and EUV photoresists in dual-frequency superimposed capacitively coupled plasmas (DFS-CCP)
- Kwon, B.S. (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Kim, H.W. (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Lee, H.J. (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Jung, H.Y. (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Lee, N.E. (Department of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University) ;
- Lee, S.K. (Research & Development Division, Hynix Semiconductor)
- Published : 2008.02.14
Abstract
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