한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
- /
- Pages.170-171
- /
- 2008
고밀도 플라즈마를 이용한 $ZrO_2$ 박막의 식각특성 연구
The etch characteristics of $ZrO_2$ thin films by using high density plasma
-
우종창
(한국전자통신연구원, 충남대학교 기계공학과) ;
-
김상기
(한국전자통신연구원, 충남대학교 기계공학과) ;
-
구진근
(한국전자통신연구원, 충남대학교 기계공학과) ;
- 장명수 (한국전자통신연구원, 충남대학교 기계공학과) ;
-
강진영
(한국전자통신연구원, 충남대학교 기계공학과)
-
Woo, Jong-Chang
(Electronics and Telecommunications Research Institute, School of Mechanical Engineering, Chung-Nam National University) ;
-
Kim, Sang-Gi
(Electronics and Telecommunications Research Institute, School of Mechanical Engineering, Chung-Nam National University) ;
-
Koo, Jin-Gun
(Electronics and Telecommunications Research Institute, School of Mechanical Engineering, Chung-Nam National University) ;
- Jang, Myoung-Soo (Electronics and Telecommunications Research Institute, School of Mechanical Engineering, Chung-Nam National University) ;
-
Kang, Jin-Yeong
(Electronics and Telecommunications Research Institute, School of Mechanical Engineering, Chung-Nam National University)
- 발행 : 2008.06.19
초록
The etching characteristics of Zirconium Oxide (