Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2008.06a
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- Pages.134-135
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- 2008
Electrical characteristic of stacked $SiO_2/ZrO_2$ for nonvolatile memory application as gate dielectric
비휘발성 메모리 적용을 위한 $SiO_2/ZrO_2$ 다층 유전막의 전기적 특성
- Park, Goon-Ho (Department of Electronic materia1s engineering, Kwangwoon Univ.) ;
- Kim, Kwan-Su (Department of Electronic materia1s engineering, Kwangwoon Univ.) ;
- Oh, Jun-Seok (Department of Electronic materia1s engineering, Kwangwoon Univ.) ;
- Jung, Jong-Wan (Department of Nano Science and Technology, Sejong Univ.) ;
- Cho, Won-Ju (Department of Electronic materia1s engineering, Kwangwoon Univ.)
- Published : 2008.06.19
Abstract
Ultra-thin
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