한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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- Pages.246-246
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- 2008
투명전도막으로써 DC 마그네트론 스퍼터링법으로 증착한 VOx 박막의 특성
Characteristics of vanadium oxide prepared by DC magnetron sputtering method for the transport conductive oxide
- Lee, Sung-Yong (Sungkynkwan Univ.) ;
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Park, Yong-Seob
(Sungkynkwan Univ.)
;
- Park, Jae-Wook (Sungkynkwan Univ.) ;
- Lee, Sung-Uk (Sungkynkwan Univ.) ;
-
Hong, Byung-You
(Sungkynkwan Univ.)
- 발행 : 2008.11.06
초록
In this work, VOx thin films have been deposited by DC magnetron sputtering method with various DC power. The characterization of the deposited thin films were changed by DC power. The experimental data are obtained on the growth rate and optical and electrical properties of VOx thin films with the increase of DC power. The growth rate. and the surface roughness decrease with DC power. Also, we investigated the electrical and optical properties of VOx thin films using hall measurement, 4-point probe, and UV-visible methods.